University of Illinois Urbana-Champaign
Illinois Materials Research Science and Engineering Center

The Plasma Etch is a 25 W direct oxygen plasma system primarily used for etching 2D materials and cleaning polymer residue from dirty samples.

This tool is located in room 350 MRL. Local users interested in using these facilities should contact Pamela Pena Martin ([email protected]) to initiate the process. Those from off-campus interested in use of these facilities should contact Prof. Arend van der Zande ([email protected]) to discuss this.