The Plasma Etch is a 25 W direct oxygen plasma system primarily used for etching 2D materials and cleaning polymer residue from dirty samples.
This tool is located in room 350 MRL. Local and off-campus users interested in using these facilities should contact mrsec-info@illinois.edu to initiate the process.
This equipment was funded through the Illinois MRSEC NSF Award Number DMR-2309037. Its use should be acknowledged in any published works, with the wording: “The authors acknowledge the use of facilities and instrumentation at the Materials Research Laboratory Central Research Facilities, University of Illinois, partially supported by NSF through the University of Illinois Materials Research Science and Engineering Center DMR-2309037.” Please also send a copy of the publication (email or hard copy), or the publication information (citation, DOI, or conference name and paper/poster title) to mrsec-info@illinois.edu.