Tergeo Indirect Plasma Functionalization System

11/20/2024

The Tergeo Plasma Cleaner is capable of direct or indirect oxygen or hydrogen plasmas. It is primarily used for chemical modification of 2D material surfaces, e.g. oxidization of chalcogenides or hydrogenation of graphene.

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The Tergeo Plasma Cleaner is capable of direct or indirect oxygen or hydrogen plasmas. It is primarily used for chemical modification of 2D material surfaces, e.g. oxidization of chalcogenides or hydrogenation of graphene.

This tool is located in room 350 MRL. Local and off-campus users interested in using these facilities should contact mrsec-info@illinois.edu to initiate the process.

This equipment was funded through the Illinois MRSEC NSF Award Number DMR-2309037Its use should be acknowledged in any published works, with the wording: “The authors acknowledge the use of facilities and instrumentation at the Materials Research Laboratory Central Research Facilities, University of Illinois, partially supported by NSF through the University of Illinois Materials Research Science and Engineering Center DMR-2309037.” Please also send a copy of the publication (email or hard copy), or the publication information (citation, DOI, or conference name and paper/poster title) to mrsec-info@illinois.edu


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This story was published November 20, 2024.