Tergeo Indirect Plasma Functionalization System

The Tergeo Plasma Cleaner is capable of direct or indirect oxygen or hydrogen plasmas. It is primarily used for chemical modification of 2D material surfaces, e.g. oxidization of chalcogenides or hydrogenation of graphene.

This tool is located in room 350 MRL. Local users interested in using these facilities should contact Pamela Pena Martin (pmartin9@illinois.edu) to initiate the process. Those from off-campus interested in use of these facilities should contact Prof. Arend van der Zande (arendv@illinois.edu) to discuss this.